TOP TOWER TECHNOLOGY CO.,LTD.

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│MOCVD system│ HVPE system│ Wafer bonder system│

The Marvel series was developed with the company's own proprietary technologies.
Marvel 180 (1x2") is best fitted for R&D activity in laboratories, while Marvel 260NT (6x2") was designed to provide total solution for mass production in the compound semiconductor industry. It provides dramatically improved yield of production through its use of proprietary gas flow injection and heating systems.

Excellent process stability, uniformity and reproducibility
Vertical flow type reactor
Reduction of particulate accumulation
Proprietary induction heating system with improved lifetime and easy maintenance
Adjustable spacing mechanism between susceptor and gas injection system.
User-friendly and flexible system control software
Minimized epitaxial process cost
Minimized run time

Wafer Capacity	1 * 2"　, 6 * 2"　, 30 x 2"　(under development)
Applications	III-Nitrides, III-V Compounds
Process Temperature	up to 1200 ℃
Temperature Uniformity	deviation of less than 2℃ at 1150 ℃
Heating Method	Induction Heating (Unique and Simplified design)
Susceptor Rotation Speed	up to 200 RPM
Process Pressure	1~760 torr (measurable ultimate pressure 0.001 torr )
Gas Supply	H2, N2, NH3, SiH4, Air
Control System	PC based control (Beckhoff & VLC)
Dimensions(unit:mm)	4760(L; Including gas cabinet)* 1900(H)* 950(D)

The SYSNEX proprietary induction heating technology (NexHeat) uses an unique concept of harmonious heating between induction coils and a heated susceptor. This gives the Marvel series an extremely high level of temperature uniformity (deviation of less than 2℃ at 1150℃ over the entire wafer pocket area).

This proprietary technology provides the 6 X 2" MOCVD system with the highly repeatable,
stable and uniform heating required for mass production of III-Nitride and III-V compound semiconductor devices. This unique approach of heating sets SYSNEX apart from other III-Nitrides MOCVD manufacturers. This technology was developed through countless experimental tests and simulation results based on theoretical background.

3Eye-view is well suited to provide real-time informations about both temperature and reflectance during growth of thin films on substrates. Using the fixed emissivity can lead to systematic errors of temperature measurements. 3EYE-View avoid this error by delivering an accurate measurement of the emissivity-corrected pyrometry. The 3EYE-View reads the changing reflectivity as well as true temperature on the substrate during the process. The corrected true temperature is suitable for precise temperature monitoring and control.

Reflectance and true temperature measurements

Wafer-selective measurements

User selectable second wavelength between 635 and 950nm

Compact size

Available in optimized versions for GaN

Communication with SUPE( MARVEL Control software )

Customized solutions for high production

Easy to analysis data tool (Software )

Taipei Taiwan: Tel:886-2-28250196／Email:toptower@tpts1.seed.net.tw
Tainan Taiwan: Tel:886-6-7032227／Email:toptower@ms31.hinet.net	Beijing China: Tel:86-10-88389596／Email:top_crystaltech@yahoo.com.cn

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