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Vertical Furnace/LPCVD System
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| Special Design
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MagicDepo technology
MagicDepo technology combined with slip Master
technology realizes backside-deposition-free LPCVD
process for the first time in the semiconductor
industry. In addition, improvement of uniformity of
front-side films can be achieved by simple modification
of the chamber module.
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Product : 300 series High Temperature Vertical Furnace
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Configuration
(300d)
- Maximum process
temperature: 1350℃
- Batch size: >100 per
chamber
- Available flat zone:
> 900mm
- Uniformity: ±0.5℃
- Process ambient:
Oxygen, Hydrogen, Argon, Nitrogen
- Full automatic
operation with stocker (SECS/GEM compatible)
- Metal contamination:
less than 1E10
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